Electrodeposition of amorphous palladium films by pulsed current electrolysis.
نویسندگان
چکیده
منابع مشابه
Nanostructuring of GeTiO amorphous films by pulsed laser irradiation
Laser pulse processing of surfaces and thin films is a useful tool for amorphous thin films crystallization, surface nanostructuring, phase transformation and modification of physical properties of thin films. Here we show the effects of nanostructuring produced at the surface and under the surface of amorphous GeTiO films through laser pulses using fluences of 10-30 mJ/cm(2). The GeTiO films w...
متن کاملPulsed electrodeposition of CuInSe2 films for photovoltaic applications
Copper indium diselenide thin films have been prepared onto ITO (In2O3:Sn) substrates by a newly developed pulsed electrodeposition method. The proposed scheme consists of a cyclically repeated pulsed potential sequence at the corresponding deposition potentials of elemental Cu, Se and In. When the potential is stepped back to the initial Cu electrodeposition potential after a full cycle to sta...
متن کاملPulsed Electrodeposition of Copper
Pulsed electrolysis of copper has been systematically investigated by electrodepositing copper from a copper sulfate bath. Pulse duty cycles of 5 to 80 percent, at frequencies from 10 to 100 Hz with current densities ranging from 2.5 to 7.5 A/dm2 were employed. The appearance of Hull Cell panels with both direct current and pulsed current was recorded. The influence of pulsed current on current...
متن کاملDevelopment of Zirconium Thin Films by Pulsed Direct Current Magnetron Sputtering: Effect of Pulsed Parameters
This paper characterizes phases present in thin Zr films at 773 K of substrate temperature. The effect of pulsed parameters such as pulse frequency, duty cycle and pulse power during the deposition of Zr film on Si(100) at the substrate temperature of 773 K has been studied. Formation of α-phase of zirconium was noticed with (001) preferred orientation at 773 K. Preferred orientation was found ...
متن کاملAgInSe2 thin films prepared by electrodeposition process
In this work, the one step electrodeposition process was used to prepare Ag-In-Se thin films. The films were deposited at room temperature from a bath containing 1-3x10 M AgNO3, 6x10 -2 M InCl3 and 3x10 -2 M of H2SeO3. The KSCN at a concentration of 0.681 M was used as complexing agent. The pH value of the solution was 1.4. Applied potentials to SCE were chosen between -0.3 V and -1.1 V. Films ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Metal Finishing Society of Japan
سال: 1987
ISSN: 1884-3395,0026-0614
DOI: 10.4139/sfj1950.38.74